Characterization in Silicon Processing

Characterization in Silicon Processing

Strausser, Yale
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This book reviews techniques by which silicon processing engineers working with semiconductors can meet the demands for improved material quality and performance made necessary by increasingly stringent requirements, such as decreasing barrier film thicknesses. Among the techniques described are monitoring the effectiveness of surface cleaning processes; determining the amount of silicon consumption during barrier film and silicide growth; and silicon selective epitaxial growth.
Categories:
Year:
1993
Publisher:
Elsevier
Language:
english
Pages:
240
ISBN 10:
0750691727
ISBN 13:
9780750691727
File:
PDF, 10.78 MB
IPFS:
CID , CID Blake2b
english, 1993
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